عنوان المقالة:Photostability and Performance of Polystyrene Films Containing 1,2,4-Triazole-3-thiol Ring System Schiff Bases Photostability and Performance of Polystyrene Films Containing 1,2,4-Triazole-3-thiol Ring System Schiff Bases
غسان قيس علي | Ghassan Qays Ali | 4866
نوع النشر
مجلة علمية
المؤلفون بالعربي
Gassan Q. Ali , Gamal A. El-Hiti , Ivan Hameed R. Tomi, Raghad Haddad, Alaa J. Al-Qaisi and Emad Yousif
المؤلفون بالإنجليزي
Gassan Q. Ali , Gamal A. El-Hiti , Ivan Hameed R. Tomi, Raghad Haddad, Alaa J. Al-Qaisi and Emad Yousif
الملخص العربي
Abstract: Series of 4-(4-substituted benzylideneamino)-5-(3,4,5-trimethoxyphenyl)-4H-1,2,4-triazole3-thiols were synthesized and their structures were confirmed. The synthesized Schiff bases were used as photostabilizers for polystyrene against photodegradation. Polystyrene polymeric films containing synthesized Schiff bases (0.5% by weight) were irradiated (λmax = 365 nm and light intensity = 6.43 × 10−9 ein·dm−3 ·s −1 ) at room temperature. The photostabilization effect of 1,2,4-triazole3-thiols Schiff bases was determined using various methods. All the additives used enhanced the photostability of polystyrene films against irradiation compared with the result obtained in the absence of Schiff base. The Schiff bases can act as photostabilizers for polystyrene through the direct absorption of UV radiation and/or radical scavengers.
تاريخ النشر
09/12/2016
الناشر
Molecules
رقم المجلد
21
رقم العدد
12
ISSN/ISBN
1420-3049
رابط DOI
doi:10.3390/molecules21121699
الصفحات
1699
رابط خارجي
https://www.mdpi.com/1420-3049/21/12/1699
الكلمات المفتاحية
photostabilization; UV light; polystyrene; 1,2,4-triazole-3-thiol; functional group index; Schiff bases
رجوع