عنوان المقالة: Microstructure and Optoelectronics Characterizations of GaxSb1-x/GaAs Heterojunction
علي حسين عبد الرزاق | | 1208
نوع النشر
أطروحة دكتوراه
المؤلفون بالعربي
المؤلفون بالإنجليزي
A.H. Jalaukhan , M.F.A.Alias , H.Kh.Al Lamy
الملخص الانجليزي
The stoichiomertic amount of the alloys GaxSb1-x with (x=0.4, 0.5 and 0.6) were sealed in quartz ampoule under pressure of 5×10-2 mbar. The ampoule containing the charge was placed in furnace at temperature of 1173 K for one hour. The GaxSb1-x bulk and thin films have a zinc blend structure. GaxSb1-x thin films have been prepared by depositing the alloys on soda lime glass substrate and (111) GaAs wafers the GaxSb1-x films prepared at different temperatures (348, 398, 448 and 473K), thicknesses of (200, 300 and 400 nm) and x by using flash evaporation technique under pressure of about 10-5 mbar with deposition rate equal to 100 nm /min. The structure of GaxSb1-x bulk and thin films were studied by x-ray diffraction analysis. Its found that they were polycrystalline and crystallizing as Zinc blend structure. The percentage of Ga and Sb in GaxSb1-x alloys and films has been determined by using energy dispersive X-ray spectroscopy (EDXS).
تاريخ النشر
23/12/2015
الناشر
LAMBERT Academic Publishing
رقم المجلد
رقم العدد
رابط الملف
تحميل (61 مرات التحميل)
الكلمات المفتاحية
GaAs wafers ,Alloys of GaxSb1-x,thin films,x-ray diffraction,EDXS,SEM,grain boundary,grain size,substrate temperatures
رجوع