عنوان المقالة:Photostability and Performance of Polystyrene Films Containing 1,2,4-Triazole-3-thiol Ring System Schiff Bases Photostability and Performance of Polystyrene Films Containing 1,2,4-Triazole-3-thiol Ring System Schiff Bases
Gassan Q. Ali , Gamal A. El-Hiti , Ivan Hameed R. Tomi, Raghad Haddad, Alaa J. Al-Qaisi and Emad Yousif
English Authors
Gassan Q. Ali , Gamal A. El-Hiti , Ivan Hameed R. Tomi, Raghad Haddad, Alaa J. Al-Qaisi and Emad Yousif
Abstract
Abstract: Series of 4-(4-substituted benzylideneamino)-5-(3,4,5-trimethoxyphenyl)-4H-1,2,4-triazole3-thiols
were synthesized and their structures were confirmed. The synthesized Schiff bases were used
as photostabilizers for polystyrene against photodegradation. Polystyrene polymeric films containing
synthesized Schiff bases (0.5% by weight) were irradiated (λmax = 365 nm and light intensity =
6.43 × 10−9
ein·dm−3
·s
−1
) at room temperature. The photostabilization effect of 1,2,4-triazole3-thiols
Schiff bases was determined using various methods. All the additives used enhanced the
photostability of polystyrene films against irradiation compared with the result obtained in the
absence of Schiff base. The Schiff bases can act as photostabilizers for polystyrene through the direct
absorption of UV radiation and/or radical scavengers.
غسان قيس علي | Ghassan Qays Ali | 4952